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《磁流變拋光液性能及加工參數(shù)優(yōu)化的研究》由會(huì)員上傳分享，免費(fèi)在線閱讀，更多相關(guān)內(nèi)容在學(xué)術(shù)論文-天天文庫(kù)。
1、南京航空航天大學(xué)碩士學(xué)位論文databaseforMRF.Appropriateprocessingparametersshouldbeselectedaccordingtotheactualprocessingrequirements.Someoccasionswhichneedmassmaterialremoval(suchasroughprocessing),largeprocessingdepth,processingdepth,irongranularityandconcentrationofceriumoxideshoul
2、dbeapriority.Sametimesmallceriumoxidegranularityshouldbealsofirstchoice.ExperimentsprovethatdischargeofMRfluidvariesfrom40to50ml/min,irongranularityvariesfrom2.5to4μm,ceriumoxidegranularityvariesfrom1.2to1.8μmhavelittleimpactontheshapeofspot.Suchprocessparametersaresuit
3、ableforsurfacemodificationorotherdeterministicprocessing.4.TooptimizepolishingprocessparametersbasedonorthogonalexperimentMaterialremovalrateandsurfaceroughnessareselectedasthetargetprocesses.Mainfactorsincludingprocessingdepth,dischargeofMRfluid,concentrationofceriumox
4、ideandceriumoxidegranularityhadbeenconsidered.Orthogonalexperimentwithfourfactorsandthreelevelshadbeenconductedinordertosearchthelawbetweenmainfactors,removalrate,andsurfaceroughness.Graycorrelationanalysishadbeenadoptedtooptimizethetwotargetprocesses.Keyword:MRFluid,MR
5、F,Sedimentation,RemovalFunction,ProcessOptimizationiii萬(wàn)方數(shù)據(jù)磁流變拋光液性能及加工參數(shù)優(yōu)化的研究目錄第1章緒論........................................................................................................................................11.1磁流變液研究背景.......................................
6、......................................................................11.1.1引言......................................................................................................................11.1.2磁流變液組成..............................................................
7、........................................11.1.3磁流變液性能......................................................................................................21.1.4MRFluid國(guó)內(nèi)外研究情況...................................................................................31.2磁流變拋光背景..
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