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1、江蘇大學(xué)碩士學(xué)位論文摘要磁控濺射法制備A1203薄膜具有高沉積速率、成膜質(zhì)量好等特點(diǎn),尤其是成膜溫度低,不影響基材的性能,所以很適用于金屬表面改性。但資料表明,國(guó)內(nèi)在鋼基上制備A1203薄膜的研究報(bào)道較少。本文主要研究鋼基上用射頻磁控濺射法制備~203薄膜。本實(shí)驗(yàn)采用A1203作為靶材,用射頻磁控濺射的方法,通過調(diào)節(jié)濺射功率,濺射氣壓,濺射時(shí)間等工藝參數(shù),在40Cr基體上制備了A1203薄膜,借助SEM、X射線衍射、傅立葉紅外光譜等測(cè)試手段,分析了薄膜的表面形貌、組織結(jié)構(gòu)、成分。鍵合等情況。通過摩擦磨損和劃痕等試驗(yàn)研究了濺射工藝參數(shù)、預(yù)處理工藝和Ni-P中間層對(duì)薄膜摩擦系數(shù)和結(jié)合
2、力的影響。研究結(jié)果表明:濺射態(tài)制備的A]203薄膜為非晶態(tài),傅立葉紅外光譜證實(shí)了薄膜中Al—O鍵的存在;用射頻磁控濺射方法,濺射功率為250W,時(shí)間為3小時(shí),氣壓為5.0Pa時(shí)制備的薄膜表面光滑致密,結(jié)合力良好?;w的腐蝕預(yù)處理和Ni.P合金中問層的加入能有效增加薄膜的結(jié)合力;A1203薄膜的摩擦系數(shù)約為O.3,中間層鎳磷合金的加入進(jìn)一步有效地減小了摩擦系數(shù),降低了磨擦損害。關(guān)鍵詞:A1203薄膜;射頻磁控濺射;結(jié)合力;摩擦系數(shù)江蘇大學(xué)碩士學(xué)位論文A1203thinfilmpreparedbymagnetronsputteringhasmanyadvantages,suchash
3、ighdepositionrate,goodfilmquality,especiallylowfilmtemperature,thusavoidingeffectontheperformanceofthesubstrate.Therefor,itissuitableforimprovingperformanceofmetalsurface.TheresearchofAl203thinfilmonsteelsubstratehasbeenmerelyreported.ThispaperismainlyabouttheresearchofpreparingA1203thinfilmo
4、nsteelsubstratebyRFmagnetronsputtering.Ab03asthetarget,adjustingsputeringpower,pressureandtime,All一03thinfilmon40CrwaspreparedbyRFmagnetronsputteringinexperiments.Thesurfacemorphology,microscopicstructure,componentandbondofthefilmWassyntheticallyanalyzedwithSEM,X-raydjf£唧cti衄.FT-IRspectroscop
5、icanalysis.TheInfluenceofprocessparameters,pretreatmentmethodandNi-Palloyinterlayeronthefrictioncoefficientandadherenceofthefilmswerestudiedbyfrictionandweartestandscratchingtest.TheresultsofexperimentindicatedthatfilmpreparedbyRFmagnetronsputteringatroomtemperaturewasamorphous.TheFT-IRspectr
6、oscopicanalysisprovedthatthereWasA1一Obondinthefilm.ThefilmpreparedbyRFmagnetronsputteringat250W,3h,5.0Pawassmooth,densifiedandhadgoodadherence.TheNi-Palloyinterlayerandcoitionpretreamentcouldeffectivelyimproveadherencebetweenfilmandsubstrate.ThefrictioncoefficientofA1203thinfilmswasabout0.3.T
7、heNi-Palloyinterlayercouldfartherdecreasethefrictioncoefficientandreducetheweardamage.Keywords:A1203thinfilm;RFmagnetronsputtering;Adherence;FrictioncoefficientⅡ?qū)W位論文版權(quán)使用授權(quán)書本學(xué)位論文作者完全了解學(xué)校有關(guān)保留、使用學(xué)位論文的規(guī)定,同意學(xué)校保留并向國(guó)家有關(guān)部門或機(jī)構(gòu)送交論文的復(fù)印件和電子版,允許論文被查閱和借閱。本