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1、哈爾濱T.業(yè)人學(xué)工學(xué)碩卜學(xué)位論文摘要本文通過(guò)X射線衍射分析、原子力顯微鏡觀察、透射電鏡觀察、紅外透射光譜分析、紫外一可見(jiàn)吸收光譜分析和光致發(fā)光試驗(yàn),研究了用金屬有機(jī)物化學(xué)汽相沉積(MOCVD)的方法,在帶有GaN緩沖層的藍(lán)寶石(A1203)襯底上,生長(zhǎng)的GaN基材料的微觀結(jié)構(gòu)、表面形貌、光吸收性質(zhì)和發(fā)光特性。X射線衍射結(jié)果表明,GaN基材料均為纖鋅礦六方結(jié)構(gòu),薄膜具有很高的結(jié)晶質(zhì)量,薄膜生長(zhǎng)沿C軸擇優(yōu)取向,緩沖層充分地發(fā)揮了作用。透射電鏡觀察表明超晶格樣品的周期結(jié)構(gòu)分布均勻,確定了超晶格的周期為13.3nm,且觀察到高密度的位錯(cuò)存
2、在于外延膜中。原子力顯微鏡觀察到樣品表面很平整,表面粗糙度低于Inm,薄膜中螺位錯(cuò)為主要的位錯(cuò)類型。此外,摻雜對(duì)GaN基材料的組織和形貌影響不大。通過(guò)光學(xué)試驗(yàn)數(shù)據(jù),計(jì)算了薄膜的厚度,分別為2gm,Iltm.39m,并確定了樣品的光學(xué)吸收邊都是在370mn附近,理論計(jì)算顯2wm和2Wma示樣品都為直接躍遷型半導(dǎo)體,禁帶寬度都約為3.4eV,摻雜對(duì)樣品的帶寬和帶系類型沒(méi)有產(chǎn)生很大的影響。樣品的折射率均隨光子能盤(pán)的增加而增加,隨波長(zhǎng)的增加而減小。計(jì)算表明消光系數(shù)的極小值位于370nm處。光致發(fā)光測(cè)試分析表明,未摻雜GaN有很好的發(fā)光性能
3、,超晶格的發(fā)光性能比未摻雜GaN高出5到10倍。由此可見(jiàn),摻雜對(duì)樣品的發(fā)光性能晃響很大,原因是摻雜引入了新的能級(jí)和缺陷。同時(shí)研究發(fā)現(xiàn)黃帶發(fā)光普遍存在于每個(gè)樣品中。關(guān)鍵詞GaN基材料;微觀結(jié)構(gòu);紅外透射光譜;紫外·可見(jiàn)吸收光譜:3}致發(fā)光哈爾濱一業(yè)大學(xué)工學(xué)碩士學(xué)位論文AbstractThemicrostructure,surfacemorphology,opticalabsorbtionpropertiesandluminescencefunctionofGaNthinfilmsgrownonthesapphiresubstrate
4、withthebuferlayerofGaNbyMOCVDhavebeenstudiedbymeansofXRD,AFM,infraredtransmissionspectrum,Uv-visibleabsorptionspectrumandphotoluminescence.XRDresultsshowthatthecrystalstructureofGaNishexagonalwurtzitestructure.Thethinfilmshaveperferredorientationincaxiswithveryhighqua
5、lity.Thebuferlayerplaysagoodroleintheinterfacebetweenthinfilmandsubstrate.TEMobservationofthecross-sectionalspecimenshowthatthereishighdislocationdensityinthesuperlatticeareawiththeaverageperiodof13.3nm.Itisobservedthatthesurfacesofallsamplesareveryflatwiththeroughnes
6、slowerthanInninvestigatedbyAFM.Screwingdislocationsexistineachthinfilm.Inaddition,impurity-dopingofsampleshaslittleinfluenceonthestructureandmorphologyofsamples.Thethicknessesofthefivesamplesare2pm,Ipm,31tm,21tmand2pmrespectively,whicharecalculatedbyrelatedopticalexpe
7、rimentaldata.Wehavealsofoundopticalabsorptionedgeatabout370nm.Thetheorycalculationindicatesthefivesamplesaredirecttransitionsemiconductorandband-gapsareabout3.4eV.Impurity-dopinghaslittleefectonthewidthandthetypeofband-gap.Therefractiveindexesofthefivesamplesincreasew
8、ithphotonenergyenhanceanddecreasewiththeincrementofwavelength.Theresultsshowthattheextinctioncoefficientshavetheminimumat370