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1、TheHullCell(U.S.Patent#2,149,344)isaminiaturetestcelldesignedtoproduceaplateddepositoverarangeofcurrentdensities.Thedepositisdependentupontheconditionoftheplatingbath(i.e.concentrationofprimarycomponents,additionagentsandimpurities).TheHullCellisausefult
2、oolforvaryingchemicalcomposition,determiningcoveringpower(thelowestcurrentdensityatwhichadepositisproduced),measuringaveragecathodeefficiency,averagemetaldistributionorthrowingpower,andobservingtheeffectsofpH,temperatureanddecompositionproducts.AclearLuc
3、iteHullCellenablestheoperatortoobservetheplatingonthebackofthetestpaneltodeterminerelativecoveringpoweratverylowcurrentdensities.赫爾槽(美國(guó)專(zhuān)利#2149344)是一種被設(shè)計(jì)用來(lái)在一定電流密度范圍內(nèi)產(chǎn)生電鍍層的小型測(cè)試槽。電鍍層的狀況由電鍍液的狀況決定(主鹽成分,添加劑和雜質(zhì))。赫爾Cell是一種有用的工具,為不同的化學(xué)組成,確定覆蓋能力(最低電流密度產(chǎn)生的鍍層),測(cè)量平均電
4、流效率,金屬平均分配或分散能力,并觀察pH值溫度和分解產(chǎn)物的影響,。一個(gè)透明的合成樹(shù)脂赫爾槽能夠讓操作者通過(guò)觀察試片背面的鍍層,以確定在非常低的電流密度下的相對(duì)覆蓋能力。TheHullCellwasoriginallydevelopedbytheR.O.HullCompany,whichlaterbecametheROHCODivisionofMcGean-Rohco,andisnowpartofAtotech.TheHullCellhasbecomeanintegralpartofplatingope
5、rationseverywhere.赫爾槽最早由赫爾公司發(fā)明,該公司現(xiàn)在是安美特公司的一個(gè)部分,赫爾槽已經(jīng)成為世界各地電鍍操作的一個(gè)必須部分。ADVANTAGESTheHullCellenablesanexperiencedoperatortodeterminethefollowingfactsaboutaplatingsolution:1.ApproximateBrightCurrentDensityRange.Thisisaccomplishedbycomparingthebrightplateda
6、reasonthepanelwithcurrentdensitiesgiveninachart.Ifthebrightoroperablerangeisbetween1-1/4”(3.2cm)and2-1/2“(6.4cm)fromtheleftsideofthepanel,andthetotalcurrentappliedis3Amps,thecorrespondingrespectivecurrentdensitiesfromaHullCellrulerorchartliebetween75Amps
7、/ft2(7.6Amps/dm2)and25Amps/ft2(2.7amps/dm2).Sincethesevaluesrepresentextremelimits,itdoesnotfollowthateitherofthesecurrentdensitiescanbeusedinaplatingbathwithoutobtainingapoordeposit.However,someintermediatecurrentdensitysuchas50Amps/ft2(5.4Amps/dm2)shou
8、ldworkbest.優(yōu)點(diǎn):赫爾槽可以讓有經(jīng)驗(yàn)的操作者確定電鍍液的以下?tīng)顩r:1.近似光亮電流密度的范圍。這是通過(guò)用給定的電流密度下比較在試片上的光亮鍍層范圍來(lái)實(shí)現(xiàn)。如果光亮或可操作的范圍為從試片的左邊算起1-1/4“(3.2厘米)和2-1/2”(6.4厘米),提供的總電流為3安培,從各自的相應(yīng)赫爾槽尺或圖表電流密度讀出電鍍范圍為75Amps/ft2(7.6Amps/dm2)和25Amps/ft2(2.7amps/dm2)。由于這些值代表了極