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1、HindawiPublishingCorporationJournalofNanomaterialsVolume2006,ArticleID64501,Pages15DOI10.1155/JNM/2006/64501AtomicLayerDepositionfortheConformalCoatingofNanoporousMaterialsJeffreyW.Elam,1GuangXiong,2CatherineY.Han,2H.HauWang,2JamesP.Birrell,2UlrichWelp,2JohnN.Hryn,1MichaelJ.Pellin
2、,2TheodoreF.Baumann,3JohnF.Poco,3andJoeH.SatcherJr.31EnergySystemsDivision,ArgonneNationalLaboratory,Argonne,IL60439,USA2MaterialsScienceDivision,ArgonneNationalLaboratory,Argonne,IL60439,USA3ChemistryandMaterialsScienceDirectorate,LawrenceLivermoreNationalLaboratory,Livermore,CA9
3、4550,USAReceived15March2006;Revised9May2006;Accepted10May2006Atomiclayerdeposition(ALD)isidealforapplyingpreciseandconformalcoatingsovernanoporousmaterials.WehaverecentlyusedALDtocoattwonanoporoussolids:anodicaluminumoxide(AAO)andsilicaaerogels.AAOpossesseshexagonallyorderedporesw
4、ithdiametersd～40nmandporelengthL～70microns.TheAAOmembraneswerecoatedbyALDtofabricatecatalyticmembranesthatdemonstrateremarkableselectivityintheoxidativedehydrogenationofcyclohexane.AdditionalAAOmembranescoatedwithALDPd?lmsshowpromiseashydrogensensors.Silicaaerogelshavethelowestden
5、sityandhighestsurfaceareaofanysolidmaterial.Consequently,thesematerialsserveasanexcellentsubstratetofabricatenovelcatalyticmaterialsandgassensorsbyALD.Copyright?2006Je?reyW.Elametal.ThisisanopenaccessarticledistributedundertheCreativeCommonsAttributionLicense,whichpermitsunrestric
6、teduse,distribution,andreproductioninanymedium,providedtheoriginalworkisproperlycited.1.INTRODUCTIONtrimethylaluminum(Al(CH3)3,TMA)todepositamono-layerofaluminum-methylgroupsandgiveo?methaneAtomiclayerdeposition(ALD)isathin?lmgrowthtech-(CH4)asabyproduct.BecauseTMAisinerttothemeth
7、yl-niquethatusesalternatingandsaturatingreactionsbetweenterminatedsurface,furtherexposuretoTMAyieldsnoad-gaseousprecursormoleculesandasubstratetodeposit?lmsditionalgrowthbeyondonemonolayer.Inreaction(B),inalayer-by-layerfashion[1,2].Byrepeatingthisreac-thisnewsurfaceisexposedtowat
8、erregeneratingtheinitialtionseque
