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1、Thefabricationofmicrolensarraydiffuserusingmicro—·areaimprintmethodAbstractInrecentyears，theresearchofmicro-opticshasbeenveryactive，Microlensandthemicrolensarrays(MLAs)asaverytypicalandcommonmicro—opticaldevicehasarousedwidespreadinterests．MLAsisthebasisofminiatureand
2、integratedopticalsystems，andhasmanyimportantapplicationsinopticalcomputing，opticaldisplay,opticalinformationprocessingandopticalcommunications．MLAsfabricationmethodhasalsobeenin—depthstudy,therearemanymanufacturedtechniquessuchas：resistmeltingmethod，黟ayscalemask，hotbo
3、ssingmethod，sol—gelmethodandPhoto—inducedcrosslinkingpolymerization．Nano—imprintlithographyisagraduallydevelopedtechnologyinrecentyears．Witlltheadvantageofhighresolution，highefficiencyandlowcost。ithasknownas”oneofthetentechnologiesthatcouldchangetheworld”．Inthispaper,
4、wepresentsanewmicrolensarrayfabricationmethods—micro-areaimprintmethod．Micro—areaimprintthroughthesmallunitregion’Srepeatedimprinttoachievethecombinationoflargeformat，thepaperexpoundedanalysisthemicro·areaimprintprinciple，designandfabricatethemicro—areaimprintmachines
5、ystem．Detailsofthemicroimprintmachinesystemisproposed，includeditsstructures，operatingprinciplesandmajorcomponents’function．Usingmicro-areaimprintmachinesystemproducedmicrolensarray．Andalargenumberofexperimentsandexplanationsaremadeaboutthepreparationoftheimpressionmat
6、erial，thefabricationofimprinttemplatesandtheselectionofimprintparameters．AfterthefabricationofMLAs，Paperproposedanewtypeofopticaldiffuserwithcascadedmicrolensarrays(MLAs)．ThediffuseriscomposedofalayerofMLAswithsmallapertureandhi曲numericalaperture(NA)onoutputsideandala
7、yerofMLAsII微區(qū)壓印法制作微透鏡陣列擴散片研究英文摘要withlargeapertureandlowNAonincidentside．Theinfluenceoftheparameters(suchassagheight，apertureetc．)ofcascadedMLAsonthediffusingbehaviorisinvestigatedbyusingofraytracingmethod．Theresultsshowthatthemaximumluminanceincreases、析ththeratioofsag
8、heighttoapertureandanadditional3-5％opticalgainCanbeaccomplishedbyinsertinganotherlayerofMLAswitllaheight—apertureratioof0．01
